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Mechanical and Materials Engineering, Materials Engineering
Year 3

Excess carrier concentrations and diffusion current density



Consider a bar of p-Si that is homogeneously doped to a value of 3x10^15 at T=300K.  The applied electric field is zero.  A light source is incident on the end of the semiconductor.  The excess-carrier concentration generated at x=0 is deltap(0)=deltan(0)=10^13/cm^3.  Neglect surface effects.  Mun=1200/cm^2/Vs.  Mup=400/cm^2/Vs.  Taun=5*10^-7s.  Taup=10^-7s.

(a) Calculate the steady state excess electron and hole concentrations as a function of distance into the semiconductor.
(b) Calculate the diffusion current density as a function of x.


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Thanks

By OTA:  Poramate Tarasak, PhD (IP)

OTA Rating:  4.9/5

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